Invention Grant
- Patent Title: Vertical field effect transistors
- Patent Title (中): 垂直场效应晶体管
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Application No.: US14965988Application Date: 2015-12-11
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Publication No.: US09570357B2Publication Date: 2017-02-14
- Inventor: Brent A. Anderson , Edward J. Nowak
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Roberts Mlotkowski Safran Cole & Calderon, P.C.
- Agent Steven Meyers; Andrew M. Calderon
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L21/8234 ; H01L29/66 ; H01L21/764 ; H01L27/088 ; H01L29/06 ; H01L29/423 ; H01L29/786

Abstract:
Vertical field effect transistors (FETs) with minimum pitch and methods of manufacture are disclosed. The structure includes at least one vertical fin structure and gate material contacting with the at least one vertical fin structure. The structure further includes metal material in electrical contact with the ends of the at least one vertical fin.
Public/Granted literature
- US20160163602A1 VERTICAL FIELD EFFECT TRANSISTORS Public/Granted day:2016-06-09
Information query
IPC分类: