Invention Grant
US09570476B2 Structure of crossing datalines and scanning lines and forming method in a display device
有权
交叉数据线和扫描线的结构以及显示装置中的形成方法
- Patent Title: Structure of crossing datalines and scanning lines and forming method in a display device
- Patent Title (中): 交叉数据线和扫描线的结构以及显示装置中的形成方法
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Application No.: US14826119Application Date: 2015-08-13
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Publication No.: US09570476B2Publication Date: 2017-02-14
- Inventor: Hong Ding
- Applicant: Shanghai Tianma Micro-Electronics Co., Ltd. , Tianma Micro-Electronics Co., Ltd.
- Applicant Address: CN Shanghai CN Shenzhen
- Assignee: SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD.,TIANMA MICRO-ELECTRONICS CO., LTD.
- Current Assignee: SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD.,TIANMA MICRO-ELECTRONICS CO., LTD.
- Current Assignee Address: CN Shanghai CN Shenzhen
- Agency: Alston & Bird LLP
- Priority: CN201510152667 20150401
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/768 ; H01L21/3213

Abstract:
The array substrate comprises: data lines and scanning lines in an insulating crossing arrangement, where the data lines comprise first data lines and second data lines, the first data lines are arranged in a same layer with the scanning lines; the second data lines electrically connecting the first data lines via first via holes; first signal lines and common electrodes arranged on a substrate, where the first signal lines are arranged insulating from and in a same layer with the second data lines, the first signal line comprises a main portion and a bending portion which is arranged adjacently to the second data line; and a second insulating layer arranged between the first signal lines and the common electrodes, where second via holes are arranged in the second insulating layer, and the common electrodes are electrically connected to the first signal lines via the second via holes.
Public/Granted literature
- US20160293630A1 ARRAY SUBSTRATE, FORMING METHOD FOR THE SAME, AND DISPLAY DEVICE Public/Granted day:2016-10-06
Information query
IPC分类: