Invention Grant
- Patent Title: Liquid ejection apparatus and method for manufacturing liquid ejection apparatus
- Patent Title (中): 液体喷射装置及液体喷射装置的制造方法
-
Application No.: US14951732Application Date: 2015-11-25
-
Publication No.: US09573372B2Publication Date: 2017-02-21
- Inventor: Taiki Tanaka
- Applicant: BROTHER KOGYO KABUSHIKI KAISHA
- Applicant Address: JP Nagoya-shi, Aichi-Ken
- Assignee: BROTHER KOGYO KABUSHIKI KAISHA
- Current Assignee: BROTHER KOGYO KABUSHIKI KAISHA
- Current Assignee Address: JP Nagoya-shi, Aichi-Ken
- Agency: Merchant & Gould P.C.
- Priority: JP2014-242978 20141201
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/14 ; B41J2/16

Abstract:
A liquid ejection apparatus and method of manufacture are disclosed. One apparatus includes a piezoelectric element corresponding to a pressure chamber in a channel substrate, a trace corresponding to the piezoelectric element. The piezoelectric element includes a piezoelectric layer, a first electrode, a second electrode disposed on a surface of the piezoelectric layer on a side opposite the channel substrate, and a protective film covering the piezoelectric layer and the second electrode. The second electrode includes a lead-out portion that extends to an area over the channel substrate where the piezoelectric layer is not disposed, and a contact portion that is provided in the lead-out portion and that is exposed from the protective film in the area. The trace is connected to the second electrode at the exposed contact portion.
Public/Granted literature
- US20160152028A1 LIQUID EJECTION APPARATUS AND METHOD FOR MANUFACTURING LIQUID EJECTION APPARATUS Public/Granted day:2016-06-02
Information query
IPC分类: