Invention Grant
- Patent Title: Silver-containing alloy plating bath and method for electrolytic plating using same
- Patent Title (中): 含银合金电镀液及其电镀方法
-
Application No.: US14269917Application Date: 2014-05-05
-
Publication No.: US09574281B2Publication Date: 2017-02-21
- Inventor: Kenji Dewaki
- Applicant: Teru Matsuura , Shinji Dewaki
- Applicant Address: JP Tokyo
- Assignee: M-TECH JAPAN CO., LTD.
- Current Assignee: M-TECH JAPAN CO., LTD.
- Current Assignee Address: JP Tokyo
- Main IPC: C25D3/56
- IPC: C25D3/56 ; C25D3/46 ; C25D3/64

Abstract:
A silver-containing alloy electrolytic plating bath that can produce silver-containing alloy plated products having excellent resistance to oxidation suitable for electronic members, decoration members, and dental members, is described, along with a method for electrolytic plating using the same. The silver-containing alloy plated products have excellent resistance to oxidation and can be manufactured by using the plating bath that contains (a) a silver compound containing 99.9% to 46% by mass of silver on the basis of the total metal mass therein, (b) a gadolinium compound containing 0.1% to 54% by mass of gadolinium on the basis of the total metal mass therein, (c) at least one kind of complexing agent, and (d) a solvent.
Public/Granted literature
- US20140238866A1 SILVER-CONTAINING ALLOY PLATING BATH AND METHOD FOR ELECTROLYTIC PLATING USING SAME Public/Granted day:2014-08-28
Information query