Invention Grant
- Patent Title: Rinsing and drying for electrochemical processing
- Patent Title (中): 电化学处理的冲洗和干燥
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Application No.: US14948259Application Date: 2015-11-21
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Publication No.: US09574283B2Publication Date: 2017-02-21
- Inventor: Charles L. Arvin , Raschid J. Bezama , Hariklia Deligianni
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Vazken Alexanian
- Main IPC: C25F3/02
- IPC: C25F3/02 ; C25D17/00 ; C25D5/48 ; C25D21/08 ; C25F3/12 ; C25F7/00

Abstract:
An electroplating/etch apparatus including a fluid jet and a dryer present over the tank containing the electrolyte for the electroplating/etch process. The fluid jet and the dryer remove excess liquids, such as electrolyte, from the component being plated or etched, e.g., working electrode. The working electrode is present on a holder that traverses from a first position within the tank during a plating or etch operation to a second position that is outside the containing the plating electrolyte. The fluid jet rinses the working electrode when the holder is in the second position, and the forced air dryer blows any remaining fluid from the fluid jet and the electrolyte from the working electrode into the tank.
Public/Granted literature
- US20160076167A1 RINSING AND DRYING FOR ELECTROCHEMICAL PROCESSING Public/Granted day:2016-03-17
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