Invention Grant
- Patent Title: Adjustable laser illumination pattern
- Patent Title (中): 可调激光照明图案
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Application No.: US14598772Application Date: 2015-01-16
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Publication No.: US09574759B2Publication Date: 2017-02-21
- Inventor: Adam Nemeyer
- Applicant: Laser Devices, Inc.
- Applicant Address: US CA Monterey
- Assignee: Steiner eOptics, Inc.
- Current Assignee: Steiner eOptics, Inc.
- Current Assignee Address: US CA Monterey
- Agency: Innovation Counsel LLP
- Main IPC: F21V29/70
- IPC: F21V29/70 ; H01S5/00 ; G02B27/09

Abstract:
A laser illuminator emitting a circular profile of substantially uniform intensity is presented. The laser illuminator may include a heat sink configured to optically couple to a laser light source. The heat sink may include a beam dump cavity configured to absorb light from the laser light source, and a circularizer aperture having a cylindrical, flat-top opening and being configured to shape a portion of laser light emitted from the laser light source to exit the heat sink. The laser illuminator may also include a collimation lens configured to collect the light exited from the heat sink and provide a focused beam of light, and a scatter clean-up aperture optically coupled to the collimation lens. The scatter clean-up aperture may be configured to absorb scatter laser light rays, and provide from the focused beam of light an output beam of light comprising a circular profile of substantially uniform intensity.
Public/Granted literature
- US20160208988A1 ADJUSTABLE LASER ILLUMINATION PATTERN Public/Granted day:2016-07-21
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