Invention Grant
- Patent Title: Pressure type flow rate control device
- Patent Title (中): 压力式流量控制装置
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Application No.: US13483328Application Date: 2012-05-30
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Publication No.: US09574917B2Publication Date: 2017-02-21
- Inventor: Atsushi Hidaka , Masaaki Nagase , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
- Applicant: Atsushi Hidaka , Masaaki Nagase , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Griffin and Szipl PC
- Priority: JP2009-273994 20091201
- Main IPC: G05D7/06
- IPC: G05D7/06 ; G01F1/36 ; G01F15/02

Abstract:
A pressure type flow rate control device provides flow rate control for gas at 100-500° C. with an error not more than 1.0% F.S. The pressure type flow rate control device includes a valve body with a fluid passage, a valve portion interposed in the passage, a valve drive unit driving the valve portion to open/close the passage, a restriction mechanism on the downstream side of the valve portion in the passage, a temperature detector detecting gas temperature between the valve portion and restriction mechanism, a pressure detector detecting gas pressure between the valve portion and restriction mechanism, and an arithmetic control device controlling flow rate of gas in the restriction mechanism based on values detected by the temperature detector and the pressure detector, wherein the temperature detector is inserted in an attachment hole of the valve body at a position just above an outlet side fluid passage.
Public/Granted literature
- US20120298220A1 PRESSURE TYPE FLOW RATE CONTROL DEVICE Public/Granted day:2012-11-29
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