Invention Grant
- Patent Title: Wavefront measurement method, shape measurement method, optical element manufacturing method, optical apparatus manufacturing method, program, and wavefront measurement apparatus
- Patent Title (中): 波前测量方法,形状测量方法,光学元件制造方法,光学装置制造方法,程序和波前测量装置
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Application No.: US14446150Application Date: 2014-07-29
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Publication No.: US09574967B2Publication Date: 2017-02-21
- Inventor: Atsushi Maeda
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2013-159174 20130731
- Main IPC: G01M11/02
- IPC: G01M11/02 ; G01J9/00

Abstract:
A wavefront measurement method includes the steps of causing object light to be incident on a Shack-Hartmann sensor, capturing a first spot image under image pickup conditions, calculating data of first spot positions that correspond to the first spot image, calculating second spot positions by simulating a second spot image on the basis of the image pickup condition and information of a travelling direction of diffracted light generated when the object light passes through the microlenses, and reducing detection errors of the spot positions by correcting the data of the first spot positions on the basis of data of the second spot positions including data of a detection error due to the diffracted light.
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