Invention Grant
US09575216B2 Infrared-transmitting film, method for producing infrared-transmitting film, infrared optical component, and infrared device
有权
红外线透射膜，红外线透射膜的制造方法，红外线光学元件以及红外线装置
- Patent Title: Infrared-transmitting film, method for producing infrared-transmitting film, infrared optical component, and infrared device
- Patent Title (中): 红外线透射膜，红外线透射膜的制造方法，红外线光学元件以及红外线装置
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Application No.: US14119654Application Date: 2012-05-01
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Publication No.: US09575216B2Publication Date: 2017-02-21
- Inventor: Jun Akedo , Hiroki Tsuda , Keishi Ohashi , Shoji Sekino , Shin Nakamura
- Applicant: Jun Akedo , Hiroki Tsuda , Keishi Ohashi , Shoji Sekino , Shin Nakamura
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-115322 20110524
- International Application: PCT/JP2012/061934 WO 20120501
- International Announcement: WO2012/160979 WO 20121129
- Main IPC: G02B1/02
- IPC: G02B1/02 ; G02B1/10 ; G02B5/20
Abstract:
An infrared-transmitting film which is excellent in mechanical strength and environmental resistance. The infrared-transmitting film comprises a buffer layer formed on a surface of an infrared optical substrate and having a Vickers hardness greater than that of the substrate and an environmental resistance improving layer provided in contact with the buffer layer and having a Vickers hardness greater than that of the buffer layer.
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