Invention Grant
US09575249B2 Method of making a metal grating in a waveguide and device formed
有权
在波导中形成金属光栅的方法和形成的器件
- Patent Title: Method of making a metal grating in a waveguide and device formed
- Patent Title (中): 在波导中形成金属光栅的方法和形成的器件
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Application No.: US13959212Application Date: 2013-08-05
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Publication No.: US09575249B2Publication Date: 2017-02-21
- Inventor: Jui Hsieh Lai , Ying-Hao Kuo
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: G02B6/10
- IPC: G02B6/10 ; G02B6/124 ; G02B6/12

Abstract:
A method of making a grating in a waveguide includes forming a waveguide material over a substrate, the waveguide material having a thickness less than or equal to about 100 nanometers (nm). The method further includes forming a photoresist over the waveguide material and patterning the photoresist. The method further includes forming a first set of openings in the waveguide material through the patterned substrate and filling the first set of openings with a metal material.
Public/Granted literature
- US20150036991A1 METHOD OF MAKING A METAL GRATING IN A WAVEGUIDE AND DEVICE FORMED Public/Granted day:2015-02-05
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