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US09575249B2 Method of making a metal grating in a waveguide and device formed 有权
在波导中形成金属光栅的方法和形成的器件

Method of making a metal grating in a waveguide and device formed
Abstract:
A method of making a grating in a waveguide includes forming a waveguide material over a substrate, the waveguide material having a thickness less than or equal to about 100 nanometers (nm). The method further includes forming a photoresist over the waveguide material and patterning the photoresist. The method further includes forming a first set of openings in the waveguide material through the patterned substrate and filling the first set of openings with a metal material.
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