Invention Grant
- Patent Title: Photoresist composition and method for producing photoresist pattern
- Patent Title (中): 光致抗蚀剂组合物及其制造方法
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Application No.: US14987303Application Date: 2016-01-04
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Publication No.: US09575408B2Publication Date: 2017-02-21
- Inventor: Mitsuyoshi Ochiai , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-001322 20150107
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; C07C303/32 ; C07C309/04 ; C07C309/06 ; C07C309/12 ; C07C309/17 ; C07C309/19 ; C07C381/12 ; C07D327/02 ; C07D327/04 ; C07D327/06 ; C07D333/46 ; C07D335/02 ; G03F7/038 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; C07C25/18 ; C07D313/10 ; G03F7/039
Abstract:
A photoresist composition comprisinga resin having an acid-labile group;a salt represented by the formula (I); anda salt represented by the formula (B1).
Public/Granted literature
- US20160195809A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN Public/Granted day:2016-07-07
Information query
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