Invention Grant
- Patent Title: Illumination system for a microlithographic projection exposure apparatus
- Patent Title (中): 用于微光刻投影曝光装置的照明系统
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Application No.: US14946284Application Date: 2015-11-19
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Publication No.: US09575414B2Publication Date: 2017-02-21
- Inventor: Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G02B27/10
- IPC: G02B27/10 ; G03B27/54 ; G03B27/72 ; G03F7/20 ; G02B3/00 ; G02B27/09
Abstract:
Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
Public/Granted literature
- US20160077446A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS Public/Granted day:2016-03-17
Information query
