Invention Grant
- Patent Title: Metal material for electronic component and method for manufacturing the same
- Patent Title (中): 电子元件用金属材料及其制造方法
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Application No.: US14346025Application Date: 2012-09-10
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Publication No.: US09576693B2Publication Date: 2017-02-21
- Inventor: Yoshitaka Shibuya , Kazuhiko Fukamachi , Atsushi Kodama
- Applicant: Yoshitaka Shibuya , Kazuhiko Fukamachi , Atsushi Kodama
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2011-205371 20110920; JP2012-033265 20120217
- International Application: PCT/JP2012/073095 WO 20120910
- International Announcement: WO2013/042572 WO 20130328
- Main IPC: B32B15/00
- IPC: B32B15/00 ; H01B1/02 ; B32B15/01 ; C25D5/10 ; C22C5/06 ; C22C5/08 ; C22C5/10 ; C22C9/00 ; C22C9/02 ; C22C9/04 ; C22C13/00 ; C22C19/03 ; C22C19/07 ; C22C22/00 ; C22C27/06 ; C22C38/00 ; C22C13/02 ; H05K3/24 ; C25D5/50 ; C25D5/12 ; C23C18/16 ; H05K1/11 ; H01R13/03 ; C25D3/12 ; C25D3/20 ; C25D3/30 ; C25D3/38 ; C25D3/46 ; C25D3/50 ; C25D3/56 ; C25D3/62 ; C25D3/64

Abstract:
There are provided a metal material for electronic component which has low insertability/extractability, low whisker formability, and high durability, and a method for manufacturing the metal material. The metal material 10 for electronic components has a base material 11, an A layer 14 constituting a surface layer on the base material 11 and formed of Sn, In or an alloy thereof, and a B layer 13 constituting a middle layer provided between the base material 11 and the A layer 14 and formed of Ag, Au, Pt, Pd, Ru, Rh, Os, Ir or an alloy thereof, wherein the surface layer (A layer) 14 has a thickness of 0.002 to 0.2 μm, and the middle layer (B layer) 13 has a thickness of 0.001 to 0.3 μm.
Public/Granted literature
- US20140329107A1 METAL MATERIAL FOR ELECTRONIC COMPONENT AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-11-06
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