Invention Grant
- Patent Title: Plasma generating device
- Patent Title (中): 等离子体发生装置
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Application No.: US14532894Application Date: 2014-11-04
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Publication No.: US09576775B2Publication Date: 2017-02-21
- Inventor: Stefan Nettesheim , Georg Kuegerl , Markus Puff
- Applicant: relyon plasma GmbH , EPCOS AG
- Applicant Address: DE Munich DE Regensburg
- Assignee: EPCOS AG,reylon plasma GmbH
- Current Assignee: EPCOS AG,reylon plasma GmbH
- Current Assignee Address: DE Munich DE Regensburg
- Agency: Simpson & Simpson, PLLC
- Priority: DE102012103938 20120504
- Main IPC: B01J19/08
- IPC: B01J19/08 ; H01J37/32 ; H05H1/36 ; H05H1/44

Abstract:
The invention relates to a plasma generation device comprising a plurality of plasma modules for generating a plasma. Each plasma module has a module housing with at least one gas inlet for supplying a process gas. Furthermore, a discharge device for generating the plasma from the process gas and a plasma outlet are provided. The plasma generation device has at least two plasma modules for generating a plasma. Each plasma module has at least one gas outlet for some of the process gas, wherein the at least one gas outlet of at least one plasma module issues into a respective gas inlet of another plasma module.
Public/Granted literature
- US20150054405A1 PLASMA GENERATING DEVICE Public/Granted day:2015-02-26
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