Invention Grant
- Patent Title: Polishing slurry for cobalt removal
- Patent Title (中): 抛光浆用于钴去除
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Application No.: US14192630Application Date: 2014-02-27
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Publication No.: US09576818B2Publication Date: 2017-02-21
- Inventor: Anne Miller , Jimmy Granstrom
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Aichi
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Aichi
- Agency: Foley & Lardner LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/321 ; C09K3/14
Abstract:
Provided herein are polishing compositions for removal of Co, for example, selectively over Cu, and methods of their use. A polishing composition comprising an abrasive and one or more Co complexors, where the polishing composition has a pH of 9 or more, and the Co complexor comprises one or more of functional groups selected from phosphonic acid (—P(═O)(OH)2) group or carboxyl (—C(═O)OH) group.
Public/Granted literature
- US20140243250A1 POLISHING SLURRY FOR COBALT REMOVAL Public/Granted day:2014-08-28
Information query
IPC分类:
