Invention Grant
US09576923B2 Semiconductor chip with patterned underbump metallization and polymer film 有权
半导体芯片具有图案化的底部金属化和聚合物膜

Semiconductor chip with patterned underbump metallization and polymer film
Abstract:
Various semiconductor chip solder bump and underbump metallization (UBM) structures and methods of making the same are disclosed. In one aspect, a method is provided that includes forming a first underbump metallization layer on a semiconductor chip is provided. The first underbump metallization layer has a hub, a first portion extending laterally from the hub, and a spoke connecting the hub to the first portion. A polymer layer is applied to the first underbump metallization layer. The polymer layer includes a first opening in alignment with the hub and a second opening in alignment with the spoke. A portion of the spoke is removed via the second opening to sever the connection between the hub and the first portion.
Information query
Patent Agency Ranking
0/0