Invention Grant
- Patent Title: Diode formed of PMOSFET and schottky diodes
- Patent Title (中): 二极管由PMOSFET和肖特基二极管组成
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Application No.: US13604299Application Date: 2012-09-05
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Publication No.: US09576949B2Publication Date: 2017-02-21
- Inventor: Jam-Wem Lee , Wan-Yen Lin , Ming-Hsiang Song , Cheng-Hsiung Kuo , Yue-Der Chih
- Applicant: Jam-Wem Lee , Wan-Yen Lin , Ming-Hsiang Song , Cheng-Hsiung Kuo , Yue-Der Chih
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/07 ; H01L27/02 ; H01L29/872 ; H01L29/06 ; H02M3/07

Abstract:
A P-type Metal-Oxide-Semiconductor Field Effect Transistor (PMOSFET) includes a gate, a first source/drain region connected to the gate, and a second source/drain region on an opposite side of the gate than the first source/drain region. A first Schottky diode includes a first anode connected to the first source/drain region, and a first cathode connected to a body of the PMOSFET. A second Schottky diode includes a second anode connected to the second source/drain region, and a second cathode connected to the body of the PMOSFET.
Public/Granted literature
- US20140062580A1 Diode Formed of PMOSFET and Schottky Diodes Public/Granted day:2014-03-06
Information query
IPC分类: