Invention Grant
- Patent Title: Devices formed from a non-polar plane of a crystalline material and method of making the same
- Patent Title (中): 由结晶材料的非极性平面形成的器件及其制造方法
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Application No.: US15082841Application Date: 2016-03-28
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Publication No.: US09576951B2Publication Date: 2017-02-21
- Inventor: Anthony J. Lochtefeld
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L33/16
- IPC: H01L33/16 ; H01L31/036 ; H01L29/04 ; H01L27/08 ; H01L21/02 ; H01L31/0304 ; H01L33/00 ; H01L33/24 ; H01L29/861 ; H01L29/20 ; C30B29/40 ; H01L33/12 ; H01L33/08

Abstract:
Materials, methods, structures and device including the same can provide a semiconductor device such as an LED using an active region corresponding to a non-polar face or surface of III-V semiconductor crystalline material. In some embodiments, an active diode region contains more non-polar III-V material oriented to a non-polar plane than III-V material oriented to a polar plane. In other embodiments, a bottom region contains more non-polar m-plane or a-plane surface area GaN than polar c-plane surface area GaN facing an active region.
Public/Granted literature
- US20160211260A1 Devices Formed from a Non-Polar Plane of a Crystalline Material and Method of Making the Same Public/Granted day:2016-07-21
Information query
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