Invention Grant
US09577135B2 CMOS compatible ultraviolet sensor device and method of producing a CMOS compatible ultraviolet sensor device
有权
CMOS兼容的紫外线传感器装置和制造CMOS兼容的紫外线传感器装置的方法
- Patent Title: CMOS compatible ultraviolet sensor device and method of producing a CMOS compatible ultraviolet sensor device
- Patent Title (中): CMOS兼容的紫外线传感器装置和制造CMOS兼容的紫外线传感器装置的方法
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Application No.: US15028010Application Date: 2014-09-30
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Publication No.: US09577135B2Publication Date: 2017-02-21
- Inventor: Friedrich Peter Leisenberger
- Applicant: ams AG
- Applicant Address: AT Unterpremstaetten
- Assignee: AMS AG
- Current Assignee: AMS AG
- Current Assignee Address: AT Unterpremstaetten
- Agency: McDermott Will & Emery LLP
- Priority: EP13188135 20131010
- International Application: PCT/EP2014/070947 WO 20140930
- International Announcement: WO2015/052044 WO 20150416
- Main IPC: H01L31/09
- IPC: H01L31/09 ; H01L31/0216 ; H01L31/113 ; H01L27/146 ; G01J1/42 ; H01L21/28 ; H01L21/3205 ; H01L27/115 ; H01L27/144 ; H01L29/49 ; H01L29/788 ; H01L31/18

Abstract:
The ultraviolet sensor device comprises a semiconductor substrate, a dielectric layer above the substrate, a surface of the dielectric layer that is provided for the incidence of ultraviolet radiation, a floating gate electrode in the dielectric layer and an electrically conductive control gate electrode near the floating gate electrode. The control gate electrode is insulated from the floating gate electrode. A sensor layer is formed by an electrically conductive further layer that is electrically conductively connected to the floating gate electrode. The control gate electrode is arranged outside a region that is located between the sensor layer and the surface provided for the incidence of ultraviolet radiation. The sensor layer is discharged by incident UV radiation and can be charged or discharged electrically by charging or discharging the floating gate electrode.
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