Invention Grant
US09577142B2 Process for forming semiconductor laser diode implemented with sampled grating
有权
用采样光栅实现的形成半导体激光二极管的工艺
- Patent Title: Process for forming semiconductor laser diode implemented with sampled grating
- Patent Title (中): 用采样光栅实现的形成半导体激光二极管的工艺
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Application No.: US14926579Application Date: 2015-10-29
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Publication No.: US09577142B2Publication Date: 2017-02-21
- Inventor: Masami Ishiura
- Applicant: Sumitomo Electric Device Innovations, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: Sumitomo Electric Device Innovations, Inc.
- Current Assignee: Sumitomo Electric Device Innovations, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Venable LLP
- Agent Michael A. Sartori; F. Brock Riggs
- Priority: JP2014-221118 20141030
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/10 ; H01S5/227 ; H01S5/0625 ; H01S5/12 ; H01S5/026 ; H01S5/50

Abstract:
A method to produce a semiconductor laser diode (LD) including a sampled grating (SG) is disclosed. The method prepares various resist patterns each including grating regions and space regions alternately arranged along an optical axis. The grating regions and the space region in respective cavity types have total widths same with the others but the grating regions in respective types has widths different from others. After the formation of the grating patterns based on the resist patterns, only one of the grating patterns is used for subsequent processes.
Public/Granted literature
- US20160126700A1 PROCESS FOR FORMING SEMICONDUCTOR LASER DIODE IMPLEMENTED WITH SAMPLED GRATING Public/Granted day:2016-05-05
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