Invention Grant
US09577187B2 Memory element with ion conductor layer in which metal ions diffuse and memory device incorporating same 有权
具有离子导体层的记忆元件,其中金属离子扩散并且存储器件并入其中

Memory element with ion conductor layer in which metal ions diffuse and memory device incorporating same
Abstract:
The present invention provides a memory element and a memory device realizing reduced variations in resistance values in an initial state or erase state of a plurality of memory elements and capable of retaining the resistance value in a write/erase state for writing/erasing operations of a plurality of times. The memory element includes a first electrode, a memory layer, and a second electrode in order. The memory layer has: an ion source layer containing at least one of chalcogen elements of tellurium (Te), sulfur (S), and selenium (Se) and at least one metal element selected from copper (Cu), silver (Ag), zinc (Zn), and zirconium (Zr); and two or more high-resistance layers having a resistance value higher than that of the ion source layer and having different compositions.
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