Invention Grant
- Patent Title: Gate pulsing gate ladder
- Patent Title (中): 门脉冲门梯
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Application No.: US14681783Application Date: 2015-04-08
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Publication No.: US09577628B2Publication Date: 2017-02-21
- Inventor: Wilbur Lew , Roland Cadotte, Jr.
- Applicant: Lockheed Martin Corporation
- Applicant Address: US MD Bethesda
- Assignee: LOCKHEED MARTIN CORPORATION
- Current Assignee: LOCKHEED MARTIN CORPORATION
- Current Assignee Address: US MD Bethesda
- Agency: Howard IP Law Group, P.C.
- Main IPC: H03K17/687
- IPC: H03K17/687 ; H03K17/14 ; H03F3/04 ; H03F3/30

Abstract:
A gate pulsing gate ladder circuit includes a series connected resistor ladder with bond pads connected to the resistor ladder between adjacent resistors. An electrical node is positioned between a first and second resistor of the resistor ladder. The electrical node is electrically connected to a gate electrode of a field effect transistor (FET). A power supply produces a constant power voltage that is applied to a pre-selected bond pad to produce a desired bias voltage at the gate electrode of the FET. A selectable gate enable voltage source is connected to an and of the resistor ladder at the first resistor and is configured to produce a first and second voltage level that when combined with the constant power voltage produces a voltage level that causes the FET to be in a conducting state or non-conducting state, respectively.
Public/Granted literature
- US20160301405A1 GATE PULSING GATE LADDER Public/Granted day:2016-10-13
Information query
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