Invention Grant
US09579874B2 Method of producing a reflection transfer for transferring a motif onto a substrate
有权
产生用于将基序转印到基底上的反射转移的方法
- Patent Title: Method of producing a reflection transfer for transferring a motif onto a substrate
- Patent Title (中): 产生用于将基序转印到基底上的反射转移的方法
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Application No.: US14042809Application Date: 2013-10-01
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Publication No.: US09579874B2Publication Date: 2017-02-28
- Inventor: Holger Weber , Harald Kaufmann
- Applicant: Holger Weber , Harald Kaufmann
- Agency: Cahn & Samuels, LLP
- Priority: EP12187461 20121005
- Main IPC: B32B38/00
- IPC: B32B38/00 ; B44C1/17 ; B44F1/02 ; B32B3/10 ; B32B37/00 ; D06Q1/00 ; D06Q1/12
Abstract:
A method of producing a reflection transfer for transferring a motif onto a substrate includes providing an adhesive-repellent base medium, applying a transfer adhesive to the base medium, creating a colored print image by offset printing or digital printing, and applying at least one reflection layer which contains a multiplicity of reflection particles.
Public/Granted literature
- US20140099483A1 Method of Producing a Reflection Transfer for Transferring a Motif onto a Substrate Public/Granted day:2014-04-10
Information query
