Invention Grant
- Patent Title: Liquid jetting apparatus
- Patent Title (中): 液体喷射装置
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Application No.: US14995674Application Date: 2016-01-14
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Publication No.: US09579891B2Publication Date: 2017-02-28
- Inventor: Hideki Hayashi , Keita Hirai , Atsushi Hirota
- Applicant: Brother Kogyo Kabushiki Kaisha
- Applicant Address: JP Nagoya-shi, Aichi-ken
- Assignee: Brother Kogyo Kabushiki Kaisha
- Current Assignee: Brother Kogyo Kabushiki Kaisha
- Current Assignee Address: JP Nagoya-shi, Aichi-ken
- Agency: Banner & Witcoff, Ltd.
- Priority: JP2015-007000 20150116
- Main IPC: B41J2/14
- IPC: B41J2/14

Abstract:
A liquid jetting apparatus includes: a flow passage structure having nozzles aligned in a first direction, pressure chambers aligned in the first direction to correspond respectively to the nozzles, and a vibration film covering the pressure chambers; piezoelectric elements arranged on the vibration film to correspond respectively to the pressure chambers; and traces extending along a planar direction of the vibration film to correspond respectively to the piezoelectric elements. Each of the piezoelectric elements has a piezoelectric film arranged to cover the pressure chambers, and an individual electrode provided on the piezoelectric film to face a central portion of one of the pressure chambers and extending in a second direction intersecting the first direction. Within each area, of the vibration film, facing one of the pressure chambers, each of the traces extends from a connecting portion of the individual electrode along a third direction intersecting the second direction.
Public/Granted literature
- US20160207312A1 Liquid Jetting Apparatus Public/Granted day:2016-07-21
Information query
IPC分类: