Invention Grant
- Patent Title: Room temperature bonding apparatus and room temperature bonding method
- Patent Title (中): 室温接合装置和室温接合方法
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Application No.: US14425966Application Date: 2013-09-25
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Publication No.: US09580306B2Publication Date: 2017-02-28
- Inventor: Masato Kinouchi , Takayuki Goto , Takeshi Tsuno , Jun Utsumi , Kensuke Ide , Takenori Suzuki , Keiichiro Tsutsumi , Hideki Takagi , Yuuichi Kurashima
- Applicant: MITSUBISHI HEAVY INDUSTRIES MACHINE TOOL CO., LTD. , NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Shiga JP Tokyo
- Assignee: MITSUBISHI HEAVY INDUSTRIES MACHINE TOOL CO., LTD.,NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: MITSUBISHI HEAVY INDUSTRIES MACHINE TOOL CO., LTD.,NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Shiga JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2012-215151 20120927
- International Application: PCT/JP2013/075955 WO 20130925
- International Announcement: WO2014/050915 WO 20140403
- Main IPC: B81C3/00
- IPC: B81C3/00 ; H01L21/67 ; B23K20/00 ; B81C99/00 ; H01L21/20

Abstract:
A room temperature bonding apparatus includes a first beam source, a second beam source, and a press bonding mechanism. The first beam source emits a first activation beam that irradiates a first surface of a first substrate. Independently from the first beam source, the second beam source emits a second activation beam that irradiates a second surface of a second substrate. The press bonding mechanism bonds between the first substrate and the second substrate by contacting between the first surface and the second surface after the first surface is irradiated with the first activation beam and the second surface is irradiated with the second activation beam. Thus, a plurality of the substrates made of different materials is appropriately bonded.
Public/Granted literature
- US20150251904A1 ROOM TEMPERATURE BONDING APPARATUS AND ROOM TEMPERATURE BONDING METHOD Public/Granted day:2015-09-10
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