Invention Grant
- Patent Title: Shadow mask alignment using variable pitch coded apertures
- Patent Title (中): 使用可变间距编码孔的阴影掩模对准
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Application No.: US14812076Application Date: 2015-07-29
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Publication No.: US09580792B2Publication Date: 2017-02-28
- Inventor: Nobuhiko Tamura
- Applicant: ADVANTECH GLOBAL, LTD
- Applicant Address: VG Tortola
- Assignee: ADVANTECH GLOBAL, LTD
- Current Assignee: ADVANTECH GLOBAL, LTD
- Current Assignee Address: VG Tortola
- Agency: The Webb Law Firm
- Main IPC: G01B11/00
- IPC: G01B11/00 ; C23C14/04 ; C23C16/04 ; G01B11/27 ; G02B27/30

Abstract:
In a shadow mask-substrate alignment method, a substrate and a shadow mask each include a grate having a plurality of bars in spaced relation, wherein for each grate, each pair of spaced bars of each grate is separated by a gap. The spacing between at least three adjacent gaps is different or not of constant pitch, and at least one grate includes a gap that extends therethrough. The grate of the substrate and the grate of the shadow mask are positioned in a light path. Thereafter, the orientation of the substrate, the shadow mask, or both are caused to be adjusted to position the grate of the substrate, the grate of the shadow mask, or both until a predetermined amount of light or range of an amount of light on the light path passing through one or both of the grates is received by a light receiver.
Public/Granted literature
- US20160024638A1 Shadow Mask Alignment Using Variable Pitch Coded Apertures Public/Granted day:2016-01-28
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