Invention Grant
- Patent Title: Magnetic-field-generating apparatus for magnetron sputtering
- Patent Title (中): 用于磁控溅射的磁场产生装置
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Application No.: US13981252Application Date: 2012-01-12
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Publication No.: US09580797B2Publication Date: 2017-02-28
- Inventor: Yoshihiko Kuriyama , Masahiro Mita
- Applicant: Yoshihiko Kuriyama , Masahiro Mita
- Applicant Address: JP Tokyo
- Assignee: HITACHI METALS, LTD.
- Current Assignee: HITACHI METALS, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-012315 20110124; JP2011-038791 20110224
- International Application: PCT/JP2012/050505 WO 20120112
- International Announcement: WO2012/102092 WO 20120802
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/35 ; H01J37/34

Abstract:
A racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering comprising a linear portion and corner portions, the linear portion comprising a magnetic base, a center permanent magnet disposed on its surface, and side permanent magnets disposed on both sides thereof with a gap; the center and side permanent magnets being vertically magnetized with opposite polarities; the corner portions comprising a non-magnetic base, a center magnetic pole member disposed on its surface, a semicircular or semi-polygonal, peripheral magnetic pole member, and plural permanent magnets arranged between both magnetic pole members with their magnetization directions in parallel to a target surface; and the magnetic poles of plural permanent magnets opposing the center magnetic pole member having the same polarity as those of the center permanent magnet opposing the target.
Public/Granted literature
- US20130299349A1 MAGNETIC-FIELD-GENERATING APPARATUS FOR MAGNETRON SPUTTERING Public/Granted day:2013-11-14
Information query
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