Invention Grant
US09580805B2 Vapor deposition system and method 有权
气相沉积系统及方法

Vapor deposition system and method
Abstract:
A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity. A deposition method is also disclosed.
Public/Granted literature
Information query
Patent Agency Ranking
0/0