Invention Grant
- Patent Title: Vapor deposition system and method
- Patent Title (中): 气相沉积系统及方法
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Application No.: US15135893Application Date: 2016-04-22
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Publication No.: US09580805B2Publication Date: 2017-02-28
- Inventor: Norman L Kester , Cliff J. Leidecker
- Applicant: QUANTUM INNOVATIONS, INC.
- Applicant Address: US OR Central Point
- Assignee: QUANTUM INNOVATIONS, INC.
- Current Assignee: QUANTUM INNOVATIONS, INC.
- Current Assignee Address: US OR Central Point
- Agency: Jerry Haynes Law
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/458 ; C23C14/56 ; C23C14/50

Abstract:
A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity. A deposition method is also disclosed.
Public/Granted literature
- US20160237562A1 VAPOR DEPOSITION SYSTEM AND METHOD Public/Granted day:2016-08-18
Information query
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