Invention Grant
US09580808B2 Apparatus for performing a plasma chemical vapour deposition process
有权
用于进行等离子体化学气相沉积工艺的装置
- Patent Title: Apparatus for performing a plasma chemical vapour deposition process
- Patent Title (中): 用于进行等离子体化学气相沉积工艺的装置
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Application No.: US13715374Application Date: 2012-12-14
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Publication No.: US09580808B2Publication Date: 2017-02-28
- Inventor: Igor Milicevic , Mattheus Jacobus Nicolaas Van Stralen , Johannes Antoon Hartsuiker
- Applicant: DRAKA COMTEQ B.V.
- Applicant Address: NL
- Assignee: Draka Comteq B.V.
- Current Assignee: Draka Comteq B.V.
- Current Assignee Address: NL
- Agency: Patterson Intellectual Property Law PC
- Priority: NL2007968 20111214
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306 ; C23C16/511 ; H01J37/32 ; C03B37/018
Abstract:
The invention relates to an apparatus for performing a plasma chemical vapor deposition process. The apparatus comprises a mainly cylindrical resonator being provided with an outer cylindrical wall enclosing a resonant cavity extending in a circumferential direction around a cylindrical axis. The resonator is further provided with side wall portions bounding the resonant cavity in the cylindrical direction, and with a slit configuration extending in a circumferential direction around the cylindrical axis providing access from the resonant cavity radially inwardly. Further, the slit configuration includes slit sections that are mutually offset in the cylindrical direction.
Public/Granted literature
- US20130152858A1 APPARATUS FOR PERFORMING A PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS Public/Granted day:2013-06-20
Information query
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