Invention Grant
US09580834B2 Growth methods for controlled large-area fabrication of high-quality graphene analogs
有权
受控大面积生产高质量石墨烯类似物的生长方法
- Patent Title: Growth methods for controlled large-area fabrication of high-quality graphene analogs
- Patent Title (中): 受控大面积生产高质量石墨烯类似物的生长方法
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Application No.: US14203958Application Date: 2014-03-11
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Publication No.: US09580834B2Publication Date: 2017-02-28
- Inventor: Sina Najmaei , Zheng Liu , Pulickel M. Ajayan , Jun Lou
- Applicant: Sina Najmaei , Zheng Liu , Pulickel M. Ajayan , Jun Lou
- Applicant Address: US TX Houston
- Assignee: WILLIAM MARSH RICE UNIVERSITY
- Current Assignee: WILLIAM MARSH RICE UNIVERSITY
- Current Assignee Address: US TX Houston
- Agency: Winstead PC
- Main IPC: C30B25/04
- IPC: C30B25/04 ; C30B25/10 ; C30B25/00 ; C23C16/30 ; C30B29/46

Abstract:
In some embodiments, the present disclosure pertains to methods of growing chalcogen-linked metallic films on a surface in a chamber. In some embodiments, the method comprises placing a metal source and a chalcogen source in the chamber, and gradually heating the chamber, where the heating leads to the chemical vapor deposition of the chalcogen source and the metal source onto the surface, and facilitates the growth of the chalcogen-linked metallic film from the chalcogen source and the metal source on the surface. In some embodiments, the chalcogen source comprises sulfur, and the metal source comprises molybdenum trioxide. In some embodiments, the growth of the chalcogen-linked metallic film occurs by formation of nucleation sites on the surface, where the nucleation sites merge to form the chalcogen-linked metallic film. In some embodiments, the formed chalcogen-linked metallic film includes MoS2.
Public/Granted literature
- US20140251204A1 NOVEL GROWTH METHODS FOR CONTROLLED LARGE-AREA FABRICATION OF HIGH-QUALITY GRAPHENE ANALOGS Public/Granted day:2014-09-11
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