Invention Grant
- Patent Title: Method for silicon carbide crystal growth by reacting elemental silicon vapor with a porous carbon solid source material
- Patent Title (中): 通过使元素硅蒸汽与多孔碳固体源材料反应生成碳化硅晶体的方法
-
Application No.: US14475803Application Date: 2014-09-03
-
Publication No.: US09580837B2Publication Date: 2017-02-28
- Inventor: Ilya Zwieback , Varatharajan Rengarajan , Bryan K. Brouhard , Michael C. Nolan , Thomas E. Anderson
- Applicant: II-VI Incorporated
- Applicant Address: US PA Saxonburg
- Assignee: II-VI Incorporated
- Current Assignee: II-VI Incorporated
- Current Assignee Address: US PA Saxonburg
- Agency: The Webb Law Firm
- Main IPC: C30B23/02
- IPC: C30B23/02 ; C30B29/36 ; C30B25/20 ; C30B25/02

Abstract:
In a method for growing bulk SiC single crystals using chemical vapor transport, wherein silicon acts as a chemical transport agent for carbon, a growth crucible is charged with a solid carbon source material and a SiC single crystal seed disposed therein in spaced relationship. A halosilane gas, such as SiCl4 and a reducing gas, such as H2, are introduced into the crucible via separate inlets and mix in the crucible interior. The crucible is heated in a manner that encourages chemical reaction between the halosilane gas and the reducing gas leading to the chemical reduction of the halosilane gas to elemental silicon (Si) vapor. The produced Si vapor is transported to the solid carbon source material where it reacts with the solid carbon source material yielding volatile Si-bearing and C-bearing molecules. The produced Si-bearing and C-bearing vapors are transported to the SiC single crystal seed and precipitate on the SiC single crystal seed causing growth of a SiC single crystal on the SiC single crystal seed.
Public/Granted literature
- US20160060789A1 Silicon Carbide Crystal Growth by Silicon Chemical Vapor Transport Public/Granted day:2016-03-03
Information query