Invention Grant
- Patent Title: Substrate film
- Patent Title (中): 基片
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Application No.: US14787436Application Date: 2014-06-19
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Publication No.: US09581730B2Publication Date: 2017-02-28
- Inventor: Se Woo Yang , Sung Hyun Nam , Kyun Il Rah , Yoon Tae Hwang , Jong Hyun Jung , Hye Min Yu , Ji Young Hwang , Eun Suk Park
- Applicant: LG Chem, Ltd.
- Applicant Address: KR
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: KR10-2013-0070530 20130619; KR10-2013-0124858 20131018
- International Application: PCT/KR2014/005441 WO 20140619
- International Announcement: WO2014/204248 WO 20141224
- Main IPC: G02B1/08
- IPC: G02B1/08 ; B32B27/08 ; B32B27/30 ; B32B27/40 ; B29C55/00 ; C08J5/18 ; B32B27/00 ; B29C55/02 ; B29K55/00 ; B29K75/00 ; B29L9/00 ; B29C55/04

Abstract:
There are provided a substrate film, a laminate, and method of manufacturing a polarizing film. The present application provides a substrate film capable of effectively manufacturing a polarizing film having a thickness of about 10 μm or less, about 8 μm or less, about 7 μm or less, about 6 μm or less, or about 5 μm or less and having an excellent function such as polarization performance, a laminate, and a method of manufacturing the same. According to the invention, it is possible to prevent tearing, curling, or the like from occurring in the elongation process and manufacture a polarizing film by easily elongating a polarization material such as a PVA-based resin.
Public/Granted literature
- US20160195641A1 SUBSTRATE FILM Public/Granted day:2016-07-07
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