Invention Grant
- Patent Title: Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof
- Patent Title (中): 具有多层叠层的极紫外反射元件及其制造方法
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Application No.: US14696325Application Date: 2015-04-24
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Publication No.: US09581890B2Publication Date: 2017-02-28
- Inventor: Ralf Hofmann , Vinayak Vishwanath Hassan , Cara Beasley , Majeed A. Foad
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: G03F1/24
- IPC: G03F1/24 ; C23C16/44 ; H01J37/32 ; H01J37/34 ; C23C14/06 ; C23C14/14 ; G03F7/20 ; G21K1/06
Abstract:
An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.
Public/Granted literature
- US20160011502A1 EXTREME ULTRAVIOLET REFLECTIVE ELEMENT WITH MULTILAYER STACK AND METHOD OF MANUFACTURING THEREOF Public/Granted day:2016-01-14
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