Invention Grant
- Patent Title: Pellicle frame and process for producing same
- Patent Title (中): 防护薄膜框架及其制造方法
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Application No.: US15026901Application Date: 2013-10-23
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Publication No.: US09581897B2Publication Date: 2017-02-28
- Inventor: Takayuki Yamaguchi , Yoshihiro Taguchi
- Applicant: NIPPON LIGHT METAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: Nippon Light Metal Company, Ltd.
- Current Assignee: Nippon Light Metal Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- International Application: PCT/JP2013/078672 WO 20131023
- International Announcement: WO2015/059783 WO 20150430
- Main IPC: G03F1/64
- IPC: G03F1/64

Abstract:
The present invention provides a pellicle frame that can prevent generation of haze and reduces a surface glittering defect under irradiation with collected light, and a method of manufacturing the pellicle frame. Specifically, provided are a pellicle frame, including: an aluminum frame material formed of aluminum or an aluminum alloy; and an anodic oxide film on a surface of the aluminum frame material, in which the anodic oxide film includes a film formed by using an alkaline anodic oxidation solution and a film formed by using an acid anodic oxidation solution, and a method of manufacturing the pellicle frame.
Public/Granted literature
- US20160259239A1 PELLICLE FRAME AND PROCESS FOR PRODUCING SAME Public/Granted day:2016-09-08
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