Invention Grant
- Patent Title: Patch containing rivastigmine
- Patent Title (中): 补丁包含利凡斯的明
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Application No.: US14118985Application Date: 2012-05-21
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Publication No.: US09585862B2Publication Date: 2017-03-07
- Inventor: Yong-youn Hwang , Won-Jae Choi , Jae-Sun Kim , Won-No Youn , Yeo-Jin Park , Joon-gyo Oh , JongSeob Im
- Applicant: Yong-youn Hwang , Won-Jae Choi , Jae-Sun Kim , Won-No Youn , Yeo-Jin Park , Joon-gyo Oh , JongSeob Im
- Applicant Address: KR Gyeonggi-do
- Assignee: SK CHEMICALS CO., LTD.
- Current Assignee: SK CHEMICALS CO., LTD.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2011-0048068 20110520
- International Application: PCT/KR2012/003986 WO 20120521
- International Announcement: WO2012/161489 WO 20121129
- Main IPC: A61F13/00
- IPC: A61F13/00 ; A61K31/325 ; A61L15/44 ; A61L15/58 ; A61K9/70 ; A61K31/27
Abstract:
The present invention relates to a rivastigmine-containing patch having improved storage stability and proper release property.
Public/Granted literature
- US20140220104A1 PATCH CONTAINING RIVASTIGMINE Public/Granted day:2014-08-07
Information query
