Invention Grant
- Patent Title: Deposition mask, producing method therefor and forming method for thin film pattern
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Application No.: US14746727Application Date: 2015-06-22
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Publication No.: US09586225B2Publication Date: 2017-03-07
- Inventor: Shigeto Sugimoto , Koichi Kajiyama , Michinobu Mizumura , Syuji Kudo , Eriko Kimura , Hany Maher Aziz , Yoshitaka Kajiyama
- Applicant: V TECHNOLOGY CO., LTD.
- Applicant Address: JP Yokohama-Shi
- Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee: V TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Yokohama-Shi
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-203154 20110916; JP2011-203155 20110916; JP2011-232538 20111024; JP2011-242089 20111104; JP2011-242090 20111104; JP2011-255298 20111122; JP2012-033657 20120220; JP2012-038101 20120224; JP2012-079207 20120330; JP2012-080707 20120330
- Main IPC: C23C14/04
- IPC: C23C14/04 ; B05B15/04 ; H01L51/00 ; C23C14/24 ; C23C14/34 ; C23C14/48 ; B23K26/00 ; H01L51/50
Abstract:
A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
Public/Granted literature
- US20150284839A1 DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN Public/Granted day:2015-10-08
Information query
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