Invention Grant
US09586850B2 Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith
有权
用于EUV光刻中使用的掺杂钛的石英玻璃的方法和根据其生产的空白
- Patent Title: Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith
- Patent Title (中): 用于EUV光刻中使用的掺杂钛的石英玻璃的方法和根据其生产的空白
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Application No.: US14911506Application Date: 2014-07-22
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Publication No.: US09586850B2Publication Date: 2017-03-07
- Inventor: Stefan Ochs , Klaus Becker , Stephan Thomas
- Applicant: Heraeus Quarzglas GmbH & Co. KG
- Applicant Address: DE Hanau
- Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee Address: DE Hanau
- Agency: Panitch Schwarze Belisario & Nadel LLP
- Priority: DE102013108885 20130816
- International Application: PCT/EP2014/065686 WO 20140722
- International Announcement: WO2015/022152 WO 20150219
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03B19/14 ; G03F1/60 ; C03C3/00 ; C03C4/00 ; G03F1/52

Abstract:
The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.
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