Invention Grant
- Patent Title: Method for calculating a height position of silicon melt surface, method for pulling silicon single crystal, and silicon single crystal pulling apparatus
- Patent Title (中): 用于计算硅熔体表面的高度位置的方法,用于拉取单晶硅的方法和硅单晶拉制装置
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Application No.: US14375080Application Date: 2013-01-22
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Publication No.: US09587325B2Publication Date: 2017-03-07
- Inventor: Naoki Masuda , Takahiro Yanagimachi
- Applicant: SHIN-ETSU HANDOTAI CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-034694 20120221
- International Application: PCT/JP2013/000276 WO 20130122
- International Announcement: WO2013/125157 WO 20130829
- Main IPC: C30B15/26
- IPC: C30B15/26 ; C30B15/20 ; C30B29/06 ; G01B11/06 ; G01B11/08 ; G01B21/08

Abstract:
A method for calculating a height position of a silicon melt surface at the time of pulling a CZ silicon single crystal is disclosed, including: obtaining a first crystal diameter measured from a fusion ring on a boundary of the silicon melt and the silicon single crystal by using a CCD camera installed at an arbitrary angle relative to the silicon single crystal, and a second crystal diameter measured by using two CCD cameras installed parallel to both ends of a crystal diameter of the silicon single crystal; and calculating the height position of the silicon melt surface in the crucible during pulling of the silicon single crystal from a difference between the first crystal diameter and the second crystal diameter. As a result, a method for enabling further accurately calculating a height position of a silicon melt surface at the time of pulling a silicon single crystal is provided.
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