Invention Grant
- Patent Title: Gas sample introduction device
- Patent Title (中): 气体样品引入装置
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Application No.: US13966765Application Date: 2013-08-14
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Publication No.: US09588088B2Publication Date: 2017-03-07
- Inventor: Akira Aono
- Applicant: SHIMADZU CORPORATION
- Applicant Address: JP Kyoto
- Assignee: SHIMADZU CORPORATION
- Current Assignee: SHIMADZU CORPORATION
- Current Assignee Address: JP Kyoto
- Agency: Sughrue Mion, PLLC
- Main IPC: G01N1/22
- IPC: G01N1/22 ; G01N30/20 ; G01N30/02 ; G01N30/08

Abstract:
In a gas sample analysis device including a metering tube, sample gas supply channel, carrier gas supply channel, evacuation channel and collection tube, there is provided a first channel switching valve which switches between a load state in which the metering tube is interposed between said sample gas supply channel and the evacuation channel and an injection state in which the metering tube is interposed between the sample gas supply channel and gas analysis device; and a second channel switching valve which, in the load state or injection state, switches between a collection tube interposition state in which the collection tube is interposed between the sample gas supply channel and the metering tube or between the metering tube and the gas analysis device, and a collection tube shunt state in which the collection tube is not interposed.
Public/Granted literature
- US20150047442A1 GAS SAMPLE INTRODUCTION DEVICE Public/Granted day:2015-02-19
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