Invention Grant
- Patent Title: Transparent conductive film and manufacturing method therefor
- Patent Title (中): 透明导电膜及其制造方法
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Application No.: US13592718Application Date: 2012-08-23
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Publication No.: US09588606B2Publication Date: 2017-03-07
- Inventor: Yuka Yamazaki , Tomotake Nashiki , Hideo Sugawara
- Applicant: Yuka Yamazaki , Tomotake Nashiki , Hideo Sugawara
- Applicant Address: JP Osaka
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2011-182738 20110824
- Main IPC: B32B3/00
- IPC: B32B3/00 ; G06F3/041

Abstract:
The present invention is a transparent conductive film having a flexible transparent base and a transparent conductive layer made of a crystalline conductive metal oxide that is formed on one surface of the flexible transparent base, in which the thickness of the flexible transparent base is 80 μm or less, and the difference H1−H2 between the dimensional change rate H1 when the transparent conductive film is heated at 140° C. for 30 minutes and the dimensional change rate H2 when the transparent conductive layer is removed from the transparent conductive film by etching and the transparent conductive film is heated at 140° C. for 30 minutes is −0.02 to 0.043%. Because of that, the level difference at the pattern boundary when the film is assembled into a touch panel, etc. is decreased and the deterioration of the appearance can be also suppressed.
Public/Granted literature
- US20130048348A1 TRANSPARENT CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR Public/Granted day:2013-02-28
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