Invention Grant
US09588890B2 Electronic device including a semiconductor memory and method for fabricating the same 有权
包括半导体存储器的电子器件及其制造方法

  • Patent Title: Electronic device including a semiconductor memory and method for fabricating the same
  • Patent Title (中): 包括半导体存储器的电子器件及其制造方法
  • Application No.: US14599234
    Application Date: 2015-01-16
  • Publication No.: US09588890B2
    Publication Date: 2017-03-07
  • Inventor: In-Hoe Kim
  • Applicant: SK hynix Inc.
  • Applicant Address: KR Icheon-Si
  • Assignee: SK hynix Inc.
  • Current Assignee: SK hynix Inc.
  • Current Assignee Address: KR Icheon-Si
  • Agency: Perkins Coie LLP
  • Priority: KR10-2014-0086132 20140709
  • Main IPC: H01L45/00
  • IPC: H01L45/00 G06F12/08 G11C11/16 H01L43/08
Electronic device including a semiconductor memory and method for fabricating the same
Abstract:
The disclosed technology provides an electronic device includes a semiconductor memory that includes a first contact plug over a substrate; an interlayer dielectric layer located over the first contact plug and having a hole which exposes at least a portion of the first contact plug; a first electrode layer formed along a sidewall and a bottom surface of the hole to be in contact with the first contact plug; a variable resistance layer over the first electrode layer and structured to include (1) a first portion that extends along the sidewall of the hole in a direction perpendicular to the substrate and exhibits a variable resistance and (2) a second portion that is parallel to the bottom surface of the hole and does not exhibit a variable resistance, and a second electrode layer formed over the variable resistance layer.
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