Invention Grant
US09589785B2 Cleaning method and composition in photolithography 有权
光刻中的清洗方法和组成

Cleaning method and composition in photolithography
Abstract:
The present disclosure provides one embodiment of a method. The method includes applying a first cleaning fluid to a substrate, thereby cleaning the substrate and forming a protection layer on the substrate; and applying a removing process to the substrate, thereby removing the protection layer from the substrate. The first cleaning fluid includes a cleaning chemical, a protection additive and a solvent.
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