Invention Grant
US09593170B2 Compound, photocurable composition, and methods for producing patterned film, optical component, circuit board, electronic component by using the photocurable composition, and cured product
有权
化合物，可光固化组合物，以及通过使用光固化性组合物制造图案膜，光学部件，电路板，电子部件的方法以及固化物
- Patent Title: Compound, photocurable composition, and methods for producing patterned film, optical component, circuit board, electronic component by using the photocurable composition, and cured product
- Patent Title (中): 化合物，可光固化组合物，以及通过使用光固化性组合物制造图案膜，光学部件，电路板，电子部件的方法以及固化物
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Application No.: US14889793Application Date: 2014-05-02
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Publication No.: US09593170B2Publication Date: 2017-03-14
- Inventor: Toshiki Ito , Takeshi Honma , Shiori Yonezawa , Hitoshi Sato , Youji Kawasaki
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2013-099551 20130509
- International Application: PCT/JP2014/002399 WO 20140502
- International Announcement: WO2014/181533 WO 20141113
- Main IPC: C08F2/50
- IPC: C08F2/50 ; C08F2/46 ; C08G61/04 ; C07C217/08 ; G03F7/00 ; H01L21/02 ; H01L21/308 ; H01L21/311 ; C07C217/40 ; G02B1/12 ; H05K3/00 ; H05K3/30
Abstract:
A compound that increases the photocuring rate of a photocurable composition and reduces the force for releasing a cured product from a mold is provided.A compound is represented by general formula (1): where Rf represents an alkyl group at least part of which is substituted with fluorine, RO represents an oxyalkylene group or a repeated structure of an oxyalkylene group, N represents a nitrogen atom, RA represents an alkyl group, and RB represents an alkyl group or a hydrogen atom.
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