Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US14351826Application Date: 2012-09-14
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Publication No.: US09594030B2Publication Date: 2017-03-14
- Inventor: Yuli Vladimirsky , Robert Tharaldsen
- Applicant: Yuli Vladimirsky , Robert Tharaldsen
- Applicant Address: NL Veldhoven
- Assignee: ASML HOLDING N.V.
- Current Assignee: ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2012/068049 WO 20120914
- International Announcement: WO2013/064298 WO 20130510
- Main IPC: G01J1/42
- IPC: G01J1/42 ; G01N21/956 ; G03F7/20 ; G03F1/84 ; G01N21/94 ; G01N21/95

Abstract:
An apparatus and a method to detect a defect or particle on a surface that involves combining an object radiation beam redirected by the surface with a reference radiation beam having a plurality of intensities lower than the object radiation beam, to produce a plurality of patterns detected by a detector in order to detect the defect or particle on the surface from the patterns.
Public/Granted literature
- US20140264054A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2014-09-18
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