Invention Grant
- Patent Title: On-axis focus sensor and method
- Patent Title (中): 轴上对焦传感器和方法
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Application No.: US14367564Application Date: 2012-12-20
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Publication No.: US09594230B2Publication Date: 2017-03-14
- Inventor: Dennis L. Ohren , Christopher J. Voges , Andrew E. Rotering
- Applicant: Rudolph Technologies, Inc.
- Applicant Address: US MA Wilmington
- Assignee: Rudolph Technologies, Inc.
- Current Assignee: Rudolph Technologies, Inc.
- Current Assignee Address: US MA Wilmington
- Agency: Dicke, Billig & Czaja, PLLC
- International Application: PCT/US2012/071030 WO 20121220
- International Announcement: WO2013/096660 WO 20130627
- Main IPC: G02B7/28
- IPC: G02B7/28 ; G01N21/84 ; G01B11/00 ; G01B11/02 ; G01B11/06 ; H04N5/232 ; G01N21/95

Abstract:
A focus height sensor in an optical system for inspection of semiconductor devices includes a sensor beam source that emits a beam of electromagnetic radiation. A reflector receives the beam of electromagnetic radiation from the sensor beam source and directs the beam toward a surface of a semiconductor device positioned within a field of view of the optical system. The reflector is positioned to receive at least a portion of the beam back from the surface of the semiconductor device to direct the returned beam to a sensor. The sensor receives the returned beam and outputs a signal correlating to a position of the surface within the field of view along an optical axis of the optical system.
Public/Granted literature
- US20140368635A1 ON-AXIS FOCUS SENSOR AND METHOD Public/Granted day:2014-12-18
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