Invention Grant
US09594306B2 Lithographic apparatus, spectral purity filter and device manufacturing method
有权
平版印刷设备，光谱纯度滤光片和器件制造方法
- Patent Title: Lithographic apparatus, spectral purity filter and device manufacturing method
- Patent Title (中): 平版印刷设备，光谱纯度滤光片和器件制造方法
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Application No.: US14002000Application Date: 2011-12-21
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Publication No.: US09594306B2Publication Date: 2017-03-14
- Inventor: Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
- Applicant: Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2011/073537 WO 20111221
- International Announcement: WO2012/119672 WO 20120913
- Main IPC: G03F7/20
- IPC: G03F7/20 ; B82Y10/00 ; G21K1/06 ; H05G2/00
Abstract:
A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
Public/Granted literature
- US20140085619A1 Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method Public/Granted day:2014-03-27
Information query
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