In an exposure station, positional information of a holding member that holds a wafer is measured by a first measurement system including a measurement member, and in a measurement station positional information of the holding member that holds a wafer is measured by a second measurement system including another measurement member. An exposure apparatus has a third measurement system which can measure positional information of the holding member when the holding member is carried from the measurement station to the exposure station. A controller, coupled to the first and the second measurement systems, controls a movement of the holding member based on the positional information measured by the first measurement system in the exposure station and also controls a movement of the holding member based on the positional information measured by the second measurement system in the measurement station.