Invention Grant
US09595384B2 Coil substrate, method for manufacturing coil substrate, and inductor
有权
线圈基板,线圈基板的制造方法以及电感器
- Patent Title: Coil substrate, method for manufacturing coil substrate, and inductor
- Patent Title (中): 线圈基板,线圈基板的制造方法以及电感器
-
Application No.: US14338483Application Date: 2014-07-23
-
Publication No.: US09595384B2Publication Date: 2017-03-14
- Inventor: Atsushi Nakamura , Tsukasa Nakanishi , Yoichi Sasada
- Applicant: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Applicant Address: JP Nagano
- Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee Address: JP Nagano
- Agency: IPUSA, PLLC
- Priority: JP2013-159571 20130731
- Main IPC: H01F5/00
- IPC: H01F5/00 ; H01F41/04 ; H01F17/00

Abstract:
A coil substrate includes a substrate, a coil-shaped wiring provided on one surface of the substrate, the coil-shaped wiring including adjacent parts provided adjacent to each other, and an insulating layer formed between the adjacent parts of the coil-shaped wiring. The coil-shaped wiring includes a first wiring, and a second wiring that is layered on the first wiring and has a thickness greater than a thickness of the first wiring. A space is provided between a side surface of the first wiring and the insulating layer. The second wiring fills the space and covers the first wiring. Both side surfaces of the second wiring contact the insulating layer.
Public/Granted literature
- US20150035634A1 COIL SUBSTRATE, METHOD FOR MANUFACTURING COIL SUBSTRATE, AND INDUCTOR Public/Granted day:2015-02-05
Information query