Invention Grant
- Patent Title: Enhancing planarization uniformity in optical devices
- Patent Title (中): 提高光学器件的平坦化均匀性
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Application No.: US13694048Application Date: 2012-10-22
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Publication No.: US09595629B2Publication Date: 2017-03-14
- Inventor: Wei Qian , Joan Fong , Dazeng Feng , Jay Jie Lai
- Applicant: Wei Qian , Joan Fong , Dazeng Feng , Jay Jie Lai
- Applicant Address: US CA Monterey Park
- Assignee: Mellanox Technologies Silicon Photonics Inc.
- Current Assignee: Mellanox Technologies Silicon Photonics Inc.
- Current Assignee Address: US CA Monterey Park
- Agency: Gavrilovich, Dodd & Lindsey, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/18 ; G02F1/025 ; G02B6/122 ; G02B6/12
Abstract:
An optical device is formed from a device precursor having a layer of a light-transmitting medium on a base. A first feature is formed on the device precursor. The device precursor is then processed such that a stop layer protects the first feature and a portion of the device precursor is above the top of the stop layer. The first feature is between the base and the stop layer. The device precursor is planarized such that the portion of the device precursor located above the top of the stop layer becomes flush with the top of the portion of the stop layer that is present on the device precursor after the planarization. During the planarization, the stop layer acts as a planarization stop that slows or stops the rate of planarization.
Public/Granted literature
- US20140113397A1 Enhancing planarization uniformity in optical devices Public/Granted day:2014-04-24
Information query
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