Invention Grant
- Patent Title: Polishing media, method for producing polishing media, and polishing method
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Application No.: US13433883Application Date: 2012-03-29
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Publication No.: US09597767B2Publication Date: 2017-03-21
- Inventor: Hideki Ishigami , Hidefumi Nakamura , Junichi Hayashi
- Applicant: Hideki Ishigami , Hidefumi Nakamura , Junichi Hayashi
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2011-074394 20110330
- Main IPC: B24B1/00
- IPC: B24B1/00 ; C09K3/14 ; B24B31/02 ; B22F3/22 ; C22C1/10 ; C22C27/04
Abstract:
A polishing media is formed of a sintered body in which a metal structure and a ceramic structure are intermingled with each other. The polishing media is preferably produced by molding a mixed powder of a metal powder and a ceramic powder by an injection molding method and sintering the resulting molded article. Further, the ceramic structure is preferably formed of aluminum oxide, and the metal structure is preferably formed of tungsten.
Public/Granted literature
- US20120252322A1 POLISHING MEDIA, METHOD FOR PRODUCING POLISHING MEDIA, AND POLISHING METHOD Public/Granted day:2012-10-04
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